Oxide Etch Rate Estimation Using Plasma Impedance Monitoring

نویسنده

  • Daniel Tsunami
چکیده

The oxide etch rate of plasma etch tools is estimated from plasma impedance monitoring data. Linear statistical modelling and stepwise regression are used to generate predictions of the mean and range oxide etch rate. The relationship of the mean etch rate to yield is explored for one processing step. Potentials for advanced process control of the etch tools are presented.

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تاریخ انتشار 2004